Growth and dielectic characterization of yttrium oxide thin films deposited on SI by r.f.- magnetron sputtering

Cranton, WM ORCID: https://orcid.org/0000-0002-0142-7810, Spink, DM, Stevens, R and Thomas, CB, 1993. Growth and dielectic characterization of yttrium oxide thin films deposited on SI by r.f.- magnetron sputtering. Thin Solid Films, 226 (1), pp. 156-160.

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Item Type:	Journal article
Publication Title:	Thin Solid Films
Creators:	Cranton, W.M., Spink, D.M., Stevens, R. and Thomas, C.B.
Date:	1993
Volume:	226
Number:	1
Divisions:	Schools > School of Science and Technology
Record created by:	EPrints Services
Date Added:	09 Oct 2015 10:55
Last Modified:	24 Mar 2022 14:48
URI:	https://irep.ntu.ac.uk/id/eprint/20194

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