Electrowetting on superhydrophobic SU-8 patterned surfaces

Herbertson, DL, Evans, CR, Shirtcliffe, NJ, McHale, G and Newton, MI ORCID: 0000-0003-4231-1002, 2005. Electrowetting on superhydrophobic SU-8 patterned surfaces. In: 13th International Conference on Solid-State Sensors, Actuators and Microsystems, Seoul, 5-9 June 2005, Seoul.

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Electrowetting on micro-patterned layers of SU-8 photoresist with an amorphous Teflon (R) coating has been observed. The cosine of the contact angle is shown to be proportional to the square of the applied voltage for increasing bias. However, this does not apply below 40 V and we suggest that this may be explained in terms of penetration of fluid into the pattern of the surface. Assuming that the initial application of a bias voltage converts the drop from Cassie-Baxter to Wenzel regime, we have used this as a technique to estimate the roughness factor of the surface.

Item Type: Conference contribution
Creators: Herbertson, D.L., Evans, C.R., Shirtcliffe, N.J., McHale, G. and Newton, M.I.
Date: 2005
Divisions: Schools > School of Science and Technology
Depositing User: EPrints Services
Date Added: 09 Oct 2015 09:58
Last Modified: 09 Jun 2017 13:15
URI: http://irep.ntu.ac.uk/id/eprint/5555

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