Area selective growth of titanium diselenide thin films into micropatterned substrates by low-pressure chemical vapor deposition

BENJAMIN, S.L., DE GROOT, C.H., GURNANI, C., HECTOR, A.L., HUANG, R., IGNATYEV, K., LEVASON, W., PEARCE, S.J., THOMAS, F. and REID, G., 2013. Area selective growth of titanium diselenide thin films into micropatterned substrates by low-pressure chemical vapor deposition. Chemistry of Materials, 25 (23), pp. 4719-4724. ISSN 1520-5002

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Item Type: Journal article
Publication Title: Chemistry of Materials
Creators: Benjamin, S.L., De Groot, C.H., Gurnani, C., Hector, A.L., Huang, R., Ignatyev, K., Levason, W., Pearce, S.J., Thomas, F. and Reid, G.
Publisher: American Chemical Society
Place of Publication: Washington DC
Date: 2013
Volume: 25
Number: 23
ISSN: 1520-5002
Identifiers:
NumberType
10.1021/cm402422eDOI
Divisions: Schools > School of Science and Technology
Depositing User: EPrints Services
Date Added: 09 Oct 2015 10:25
Last Modified: 09 Jun 2017 13:29
URI: http://irep.ntu.ac.uk/id/eprint/12689

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