Area selective growth of titanium diselenide thin films into micropatterned substrates by low-pressure chemical vapor deposition

Benjamin, S.L. ORCID: 0000-0002-5038-1599, De Groot, C.H., Gurnani, C., Hector, A.L., Huang, R., Ignatyev, K., Levason, W., Pearce, S.J., Thomas, F. and Reid, G., 2013. Area selective growth of titanium diselenide thin films into micropatterned substrates by low-pressure chemical vapor deposition. Chemistry of Materials, 25 (23), pp. 4719-4724. ISSN 1520-5002

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Item Type: Journal article
Publication Title: Chemistry of Materials
Creators: Benjamin, S.L., De Groot, C.H., Gurnani, C., Hector, A.L., Huang, R., Ignatyev, K., Levason, W., Pearce, S.J., Thomas, F. and Reid, G.
Publisher: American Chemical Society
Place of Publication: Washington DC
Date: 2013
Volume: 25
Number: 23
ISSN: 1520-5002
Identifiers:
NumberType
10.1021/cm402422eDOI
Divisions: Schools > School of Science and Technology
Depositing User: EPrints Services
Date Added: 09 Oct 2015 10:25
Last Modified: 09 Jun 2017 13:29
URI: http://irep.ntu.ac.uk/id/eprint/12689

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