Area selective growth of titanium diselenide thin films into micropatterned substrates by low-pressure chemical vapor deposition

Benjamin, SL ORCID: https://orcid.org/0000-0002-5038-1599, De Groot, CH, Gurnani, C, Hector, AL, Huang, R, Ignatyev, K, Levason, W, Pearce, SJ, Thomas, F and Reid, G, 2013. Area selective growth of titanium diselenide thin films into micropatterned substrates by low-pressure chemical vapor deposition. Chemistry of Materials, 25 (23), pp. 4719-4724. ISSN 1520-5002

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Item Type:	Journal article
Publication Title:	Chemistry of Materials
Creators:	Benjamin, S.L., De Groot, C.H., Gurnani, C., Hector, A.L., Huang, R., Ignatyev, K., Levason, W., Pearce, S.J., Thomas, F. and Reid, G.
Publisher:	American Chemical Society
Place of Publication:	Washington DC
Date:	2013
Volume:	25
Number:	23
ISSN:	1520-5002
Identifiers:	Number Type 10.1021/cm402422e DOI
Divisions:	Schools > School of Science and Technology
Record created by:	EPrints Services
Date Added:	09 Oct 2015 10:25
Last Modified:	09 Jun 2017 13:29
URI:	https://irep.ntu.ac.uk/id/eprint/12689

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