A new reactive sputtering technique for the low temperature deposition of transparent light emitting ZnS:Mn thin films

WAKEHAM, S., THWAITES, M., TSAKONAS, C., CRANTON, W., RANSON, R., BOUTAUD, G. and KOUTSOGEORGIS, D.C., 2010. A new reactive sputtering technique for the low temperature deposition of transparent light emitting ZnS:Mn thin films. Physica Status Solidi A, 207 (7), pp. 1614-1618. ISSN 1862-6300

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Abstract

The temperature sensitive nature of the substrates used in the flexible displays market necessitates a low temperature deposition technique for processing them. ZnS:Mn exhibiting high intensity photoluminescence and good crystallinity has been deposited onto Si wafers, glass microscope slides and polymeric substrates using a new reactive sputtering technology referred to as HiTUS. This technique enables very high deposition rates and requires no substrate heating. When incorporated as part of a complete EL device, as-deposited ZnS:Mn films are seen to exhibit stable electroluminescence on Si, glass and planarised PET substrate materials. Post annealing of the devices on Si and glass at temperatures of up to 600 °C show that the HiTUS films perform better than equivalent ZnS:Mn films deposited using RF magnetron sputtering.

Item Type: Journal article
Publication Title: Physica Status Solidi A
Creators: Wakeham, S., Thwaites, M., Tsakonas, C., Cranton, W., Ranson, R., Boutaud, G. and Koutsogeorgis, D.C.
Publisher: Wiley-Blackwell
Date: 2010
Volume: 207
Number: 7
ISSN: 1862-6300
Identifiers:
NumberType
10.1002/pssa.200983757DOI
Rights: Copyright © 2010 John Wiley & Sons, Inc. All Rights Reserved.
Divisions: Schools > School of Science and Technology
Depositing User: EPrints Services
Date Added: 09 Oct 2015 10:33
Last Modified: 26 Sep 2016 06:36
URI: http://irep.ntu.ac.uk/id/eprint/14612

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