A new reactive sputtering technique for the low temperature deposition of transparent light emitting ZnS:Mn thin films

Wakeham, S, Thwaites, M, Tsakonas, C ORCID: https://orcid.org/0000-0002-7342-3405, Cranton, W ORCID: https://orcid.org/0000-0002-0142-7810, Ranson, R ORCID: https://orcid.org/0000-0002-4619-3982, Boutaud, G and Koutsogeorgis, DC ORCID: https://orcid.org/0000-0001-6167-1084, 2010. A new reactive sputtering technique for the low temperature deposition of transparent light emitting ZnS:Mn thin films. Physica Status Solidi A, 207 (7), pp. 1614-1618. ISSN 1862-6300

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Abstract

The temperature sensitive nature of the substrates used in the flexible displays market necessitates a low temperature deposition technique for processing them. ZnS:Mn exhibiting high intensity photoluminescence and good crystallinity has been deposited onto Si wafers, glass microscope slides and polymeric substrates using a new reactive sputtering technology referred to as HiTUS. This technique enables very high deposition rates and requires no substrate heating. When incorporated as part of a complete EL device, as-deposited ZnS:Mn films are seen to exhibit stable electroluminescence on Si, glass and planarised PET substrate materials. Post annealing of the devices on Si and glass at temperatures of up to 600 °C show that the HiTUS films perform better than equivalent ZnS:Mn films deposited using RF magnetron sputtering.

Item Type:	Journal article
Publication Title:	Physica Status Solidi A
Creators:	Wakeham, S., Thwaites, M., Tsakonas, C., Cranton, W., Ranson, R., Boutaud, G. and Koutsogeorgis, D.C.
Publisher:	Wiley-Blackwell
Date:	2010
Volume:	207
Number:	7
ISSN:	1862-6300
Identifiers:	Number Type 10.1002/pssa.200983757 DOI
Rights:	Copyright © 2010 John Wiley & Sons, Inc. All Rights Reserved.
Divisions:	Schools > School of Science and Technology
Record created by:	EPrints Services
Date Added:	09 Oct 2015 10:33
Last Modified:	04 Feb 2022 14:54
URI:	https://irep.ntu.ac.uk/id/eprint/14612

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