Chemical vapour deposition of antimony chalcogenides with positional and orientational control: precursor design and substrate selectivity

Benjamin, S.L. ORCID: 0000-0002-5038-1599, De Groot, C.H., Hector, A.L., Huang, R., Koukharenko, E., Levason, W. and Reid, G., 2015. Chemical vapour deposition of antimony chalcogenides with positional and orientational control: precursor design and substrate selectivity. Journal of Materials Chemistry C, 3 (2), pp. 423-430. ISSN 2050-7534

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Item Type: Journal article
Publication Title: Journal of Materials Chemistry C
Creators: Benjamin, S.L., De Groot, C.H., Hector, A.L., Huang, R., Koukharenko, E., Levason, W. and Reid, G.
Publisher: Royal Society of Chemistry
Place of Publication: Cambridge
Date: 2015
Volume: 3
Number: 2
ISSN: 2050-7534
Identifiers:
NumberType
10.1039/c4tc02327gDOI
Divisions: Schools > School of Science and Technology
Depositing User: EPrints Services
Date Added: 09 Oct 2015 10:36
Last Modified: 09 Jun 2017 13:34
URI: http://irep.ntu.ac.uk/id/eprint/15455

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