Chemical vapour deposition of antimony chalcogenides with positional and orientational control: precursor design and substrate selectivity

BENJAMIN, S.L., DE GROOT, C.H., HECTOR, A.L., HUANG, R., KOUKHARENKO, E., LEVASON, W. and REID, G., 2015. Chemical vapour deposition of antimony chalcogenides with positional and orientational control: precursor design and substrate selectivity. Journal of Materials Chemistry C, 3 (2), pp. 423-430. ISSN 2050-7534

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Item Type: Journal article
Publication Title: Journal of Materials Chemistry C
Creators: Benjamin, S.L., De Groot, C.H., Hector, A.L., Huang, R., Koukharenko, E., Levason, W. and Reid, G.
Publisher: Royal Society of Chemistry
Place of Publication: Cambridge
Date: 2015
Volume: 3
Number: 2
ISSN: 2050-7534
Identifiers:
NumberType
10.1039/c4tc02327gDOI
Divisions: Schools > School of Science and Technology
Depositing User: EPrints Services
Date Added: 09 Oct 2015 10:36
Last Modified: 23 Aug 2016 09:11
URI: http://irep.ntu.ac.uk/id/eprint/15455

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