Chemical vapour deposition of antimony chalcogenides with positional and orientational control: precursor design and substrate selectivity

Benjamin, SL ORCID: https://orcid.org/0000-0002-5038-1599, De Groot, CH, Hector, AL, Huang, R, Koukharenko, E, Levason, W and Reid, G, 2015. Chemical vapour deposition of antimony chalcogenides with positional and orientational control: precursor design and substrate selectivity. Journal of Materials Chemistry C, 3 (2), pp. 423-430. ISSN 2050-7534

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Item Type:	Journal article
Publication Title:	Journal of Materials Chemistry C
Creators:	Benjamin, S.L., De Groot, C.H., Hector, A.L., Huang, R., Koukharenko, E., Levason, W. and Reid, G.
Publisher:	Royal Society of Chemistry
Place of Publication:	Cambridge
Date:	2015
Volume:	3
Number:	2
ISSN:	2050-7534
Identifiers:	Number Type 10.1039/c4tc02327g DOI
Divisions:	Schools > School of Science and Technology
Record created by:	EPrints Services
Date Added:	09 Oct 2015 10:36
Last Modified:	09 Jun 2017 13:34
URI:	https://irep.ntu.ac.uk/id/eprint/15455

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