Characterization of BaTiO3 thin films deposited by RF magnetron sputtering for use in a.c. TFEL devices

Craven, MR, Cranton, WM, Toal, S and Reehal, HS, 1998. Characterization of BaTiO3 thin films deposited by RF magnetron sputtering for use in a.c. TFEL devices. Semiconductor Science and Technology, 13 (4), pp. 404-409.

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Item Type: Journal article
Publication Title: Semiconductor Science and Technology
Creators: Craven, M.R., Cranton, W.M., Toal, S. and Reehal, H.S.
Date: 1998
Volume: 13
Number: 4
Divisions: Schools > School of Science and Technology
Depositing User: EPrints Services
Date Added: 09 Oct 2015 10:38
Last Modified: 19 Oct 2015 14:34
URI: http://irep.ntu.ac.uk/id/eprint/15868

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