Characterization of BaTiO3 thin films deposited by RF magnetron sputtering for use in a.c. TFEL devices

CRAVEN, M.R., CRANTON, W.M., TOAL, S. and REEHAL, H.S., 1998. Characterization of BaTiO3 thin films deposited by RF magnetron sputtering for use in a.c. TFEL devices. Semiconductor Science and Technology, 13 (4), pp. 404-409.

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Item Type: Journal article
Publication Title: Semiconductor Science and Technology
Creators: Craven, M.R., Cranton, W.M., Toal, S. and Reehal, H.S.
Date: 1998
Volume: 13
Number: 4
Divisions: Schools > School of Science and Technology
Depositing User: EPrints Services
Date Added: 09 Oct 2015 10:38
Last Modified: 19 Oct 2015 14:34
URI: http://irep.ntu.ac.uk/id/eprint/15868

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