Characterization of BaTiO3 thin films deposited by RF magnetron sputtering for use in a.c. TFEL devices

Craven, MR, Cranton, WM ORCID: https://orcid.org/0000-0002-0142-7810, Toal, S and Reehal, HS, 1998. Characterization of BaTiO3 thin films deposited by RF magnetron sputtering for use in a.c. TFEL devices. Semiconductor Science and Technology, 13 (4), pp. 404-409.

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Item Type:	Journal article
Publication Title:	Semiconductor Science and Technology
Creators:	Craven, M.R., Cranton, W.M., Toal, S. and Reehal, H.S.
Date:	1998
Volume:	13
Number:	4
Divisions:	Schools > School of Science and Technology
Record created by:	EPrints Services
Date Added:	09 Oct 2015 10:38
Last Modified:	24 Mar 2022 14:44
URI:	https://irep.ntu.ac.uk/id/eprint/15868

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