Recent progress in photonic processing of metal‐oxide transistors

Tools

Yarali, E., Koutsiaki, C., Faber, H., Tetzner, K., Yengel, E., Patsalas, P., Kalfagiannis, N. ORCID: 0000-0002-4030-5525, Koutsogeorgis, D.C. ORCID: 0000-0001-6167-1084 and Anthopoulos, T.D., 2019. Recent progress in photonic processing of metal‐oxide transistors. Advanced Functional Materials. ISSN 1616-301X

Preview

Text
1238111_Kalfagiannis.pdf .pdf - Post-print
Download (3MB) | Preview

Official URL: https://doi.org/10.1002/adfm.201906022

Abstract

Over the past few decades, significant progress has been made in the field of photonic processing of electronic materials using a variety of light sources. Several of these technologies have now been exploited in conjunction with emerging electronic materials as alternatives to conventional high temperature thermal annealing offering rapid manufacturing times and compatibility with temperature-sensitive substrate materials among other potential advantages. A review of recent advances in photonic processing paradigms of metal oxide thin film transistors (TFTs), is presented with particular emphasis on the use of various light source technologies for the photochemical and thermochemical conversion of precursor materials or post-deposition treatment of metal oxides and their application in thin-film electronics. The pros and cons of the different technologies are discussed in light of recent developments and prospective research in the field of modern large-area electronics is highlighted.

Item Type:

Journal article

Publication Title:

Advanced Functional Materials

Creators:

Yarali, E., Koutsiaki, C., Faber, H., Tetzner, K., Yengel, E., Patsalas, P., Kalfagiannis, N., Koutsogeorgis, D.C. and Anthopoulos, T.D.

Publisher:

Wiley

Date:

22 October 2019

ISSN:

1616-301X