Recent progress in photonic processing of metal‐oxide transistors

Yarali, E, Koutsiaki, C, Faber, H, Tetzner, K, Yengel, E, Patsalas, P, Kalfagiannis, N ORCID: https://orcid.org/0000-0002-4030-5525, Koutsogeorgis, DC ORCID: https://orcid.org/0000-0001-6167-1084 and Anthopoulos, TD, 2019. Recent progress in photonic processing of metal‐oxide transistors. Advanced Functional Materials. ISSN 1616-301X

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Abstract

Over the past few decades, significant progress has been made in the field of photonic processing of electronic materials using a variety of light sources. Several of these technologies have now been exploited in conjunction with emerging electronic materials as alternatives to conventional high temperature thermal annealing offering rapid manufacturing times and compatibility with temperature-sensitive substrate materials among other potential advantages. A review of recent advances in photonic processing paradigms of metal oxide thin film transistors (TFTs), is presented with particular emphasis on the use of various light source technologies for the photochemical and thermochemical conversion of precursor materials or post-deposition treatment of metal oxides and their application in thin-film electronics. The pros and cons of the different technologies are discussed in light of recent developments and prospective research in the field of modern large-area electronics is highlighted.

Item Type:	Journal article
Publication Title:	Advanced Functional Materials
Creators:	Yarali, E., Koutsiaki, C., Faber, H., Tetzner, K., Yengel, E., Patsalas, P., Kalfagiannis, N., Koutsogeorgis, D.C. and Anthopoulos, T.D.
Publisher:	Wiley
Date:	22 October 2019
ISSN:	1616-301X
Identifiers:	Number Type 10.1002/adfm.201906022 DOI 1238111 Other
Divisions:	Schools > School of Science and Technology
Record created by:	Linda Sullivan
Date Added:	27 Nov 2019 16:32
Last Modified:	27 Nov 2019 16:32
URI:	https://irep.ntu.ac.uk/id/eprint/38589

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