The adsorption and desorption processes accompanying the chemical vapour deposition of silane on Cu(111) and Ni(111)

SHUTTLEWORTH, I.G. and ALLISON, W., 2001. The adsorption and desorption processes accompanying the chemical vapour deposition of silane on Cu(111) and Ni(111). Surface Review and Letters, 8 (6), pp. 613-620. ISSN 0218-625X

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Item Type: Journal article
Publication Title: Surface Review and Letters
Creators: Shuttleworth, I.G. and Allison, W.
Publisher: World Scientific Publishing Co. Pte. Ltd.
Place of Publication: Singapore
Date: 2001
Volume: 8
Number: 6
ISSN: 0218-625X
Identifiers:
NumberType
10.1142/S0218625X01001567DOI
Divisions: Schools > School of Science and Technology
Depositing User: EPrints Services
Date Added: 09 Oct 2015 10:06
Last Modified: 09 Jun 2017 13:19
URI: http://irep.ntu.ac.uk/id/eprint/7833

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