The adsorption and desorption processes accompanying the chemical vapour deposition of silane on Cu(111) and Ni(111)

Shuttleworth, I.G. ORCID: 0000-0001-8655-9718 and Allison, W., 2001. The adsorption and desorption processes accompanying the chemical vapour deposition of silane on Cu(111) and Ni(111). Surface Review and Letters, 8 (6), pp. 613-620. ISSN 0218-625X

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Item Type: Journal article
Publication Title: Surface Review and Letters
Creators: Shuttleworth, I.G. and Allison, W.
Publisher: World Scientific Publishing Co. Pte. Ltd.
Place of Publication: Singapore
Date: 2001
Volume: 8
Number: 6
ISSN: 0218-625X
Identifiers:
NumberType
10.1142/S0218625X01001567DOI
Divisions: Schools > School of Science and Technology
Depositing User: EPrints Services
Date Added: 09 Oct 2015 10:06
Last Modified: 09 Jun 2017 13:19
URI: http://irep.ntu.ac.uk/id/eprint/7833

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