The adsorption and desorption processes accompanying the chemical vapour deposition of silane on Cu(111) and Ni(111)

Shuttleworth, IG ORCID: https://orcid.org/0000-0001-8655-9718 and Allison, W, 2001. The adsorption and desorption processes accompanying the chemical vapour deposition of silane on Cu(111) and Ni(111). Surface Review and Letters, 8 (6), pp. 613-620. ISSN 0218-625X

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Item Type:	Journal article
Publication Title:	Surface Review and Letters
Creators:	Shuttleworth, I.G. and Allison, W.
Publisher:	World Scientific Publishing Co. Pte. Ltd.
Place of Publication:	Singapore
Date:	2001
Volume:	8
Number:	6
ISSN:	0218-625X
Identifiers:	Number Type 10.1142/S0218625X01001567 DOI
Divisions:	Schools > School of Science and Technology
Record created by:	EPrints Services
Date Added:	09 Oct 2015 10:06
Last Modified:	09 Jun 2017 13:19
URI:	https://irep.ntu.ac.uk/id/eprint/7833

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