Low temperature remote plasma sputtering of indium tin oxide for flexible display applications

Wakeham, SJ, Thwaites, MJ, Holton, BW, Tsakonas, C ORCID: https://orcid.org/0000-0002-7342-3405, Cranton, WM ORCID: https://orcid.org/0000-0002-0142-7810, Koutsogeorgis, DC ORCID: https://orcid.org/0000-0001-6167-1084 and Ranson, RM ORCID: https://orcid.org/0000-0002-4619-3982, 2009. Low temperature remote plasma sputtering of indium tin oxide for flexible display applications. Thin Solid Films, 518 (4), pp. 1355-1358. ISSN 0040-6090

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Abstract

Tin doped indium oxide (ITO) has been directly deposited onto a variety of flexible materials by a reactive sputtering technique that utilises a remotely generated, high density plasma. This technique, known as high target utilisation sputtering (HiTUS), allows for the high rate deposition of good quality ITO films onto polymeric materials with no substrate heating or post deposition annealing. Coatings with a resistivity of 3.8 ×10−4 Ωcm and an average visible transmission of greater than 90% have been deposited onto PEN and PET substrate materials at a deposition rate of 70 nm/min. The electrical and optical properties are retained when the coatings are flexed through a 1.0 cm bend radius, making them of interest for flexible display applications.

Item Type:	Journal article
Publication Title:	Thin Solid Films
Creators:	Wakeham, S.J., Thwaites, M.J., Holton, B.W., Tsakonas, C., Cranton, W.M., Koutsogeorgis, D.C. and Ranson, R.M.
Publisher:	Elsevier (not including Cell Press)
Date:	2009
Volume:	518
Number:	4
ISSN:	0040-6090
Identifiers:	Number Type 10.1016/j.tsf.2009.04.072 DOI
Divisions:	Schools > School of Science and Technology
Record created by:	EPrints Services
Date Added:	09 Oct 2015 10:48
Last Modified:	04 Feb 2022 14:56
URI:	https://irep.ntu.ac.uk/id/eprint/18519

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