Electrowetting on superhydrophobic SU-8 patterned surfaces

Herbertson, DL, Evans, CR, Shirtcliffe, NJ, McHale, G and Newton, MI ORCID: https://orcid.org/0000-0003-4231-1002, 2006. Electrowetting on superhydrophobic SU-8 patterned surfaces. Sensors and Actuators A - Physical, 130, pp. 189-193. ISSN 0924-4247

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Abstract

Electrowetting on micro-patterned layers of SU8 photoresist with an amorphous Teflon® coating has been observed. The cosine of the contact angle is shown to be proportional to the square of the applied voltage for increasing bias. However, this does not apply below 40V and we suggest that this may be explained in terms of penetration of fluid into the pattern of the surface. Assuming that the initial application of a bias voltage converts the drop from Cassie-Baxter to Wenzel regime, we have used this as a technique to estimate the roughness factor of the surface.

Item Type:	Journal article
Description:	Post-print
Publication Title:	Sensors and Actuators A - Physical
Creators:	Herbertson, D.L., Evans, C.R., Shirtcliffe, N.J., McHale, G. and Newton, M.I.
Publisher:	Elsevier
Place of Publication:	Lausanne, Switzerland
Date:	2006
Volume:	130
ISSN:	0924-4247
Identifiers:	Number Type 10.1016/j.sna.2005.12.018 DOI
Rights:	Copyright ©2005 Elsevier B.V.
Divisions:	Schools > School of Science and Technology
Record created by:	EPrints Services
Date Added:	09 Oct 2015 09:40
Last Modified:	09 Jun 2017 13:07
URI:	https://irep.ntu.ac.uk/id/eprint/779

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